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dc.date.accessioned2022-11-07T16:40:12Z
dc.date.available2022-11-07T16:40:12Z
dc.date.created2022-04-28T13:11:21Z
dc.date.issued2022
dc.identifier.citationKjølerbakken, Kai Morgan Miloch, Wojciech Jacek Martinsen, Ørjan Grøttem Pabst, Oliver Røed, Ketil . Numerical Study of Non-Linear Effects for a Swept Bias Langmuir Probe. IEEE Transactions on Plasma Science. 2022, 50(5), 1237-1245
dc.identifier.urihttp://hdl.handle.net/10852/97517
dc.description.abstractWe present a numerical study disclosing non-linear effects and hysteresis loops for a swept bias Langmuir probe. A full kinetic particle in cell (PIC) model has been used to study the temporal sheath effects and the probe current. Langmuir "close to steady state" condition is required to characterize the plasma. However, during operations above frequencies normally used, capacitive and non-linear resistive effects are being unveiled. We demonstrate how ion and electron density and temperature change properties of the probe-plasma system. We also show that a swept Langmuir probe exhibits essential properties described as the "fingerprint of memristors" and how a Langmuir probe can be identified as a transversal memristor. Understanding non-linear processes might enable new ways to operate Langmuir probes with higher sampling rates and better accuracy.
dc.description.abstractNumerical Study of Non-Linear Effects for a Swept Bias Langmuir Probe
dc.languageEN
dc.rightsAttribution 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titleNumerical Study of Non-Linear Effects for a Swept Bias Langmuir Probe
dc.title.alternativeENEngelskEnglishNumerical Study of Non-Linear Effects for a Swept Bias Langmuir Probe
dc.typeJournal article
dc.creator.authorKjølerbakken, Kai Morgan
dc.creator.authorMiloch, Wojciech Jacek
dc.creator.authorMartinsen, Ørjan Grøttem
dc.creator.authorPabst, Oliver
dc.creator.authorRøed, Ketil
cristin.unitcode185,15,4,0
cristin.unitnameFysisk institutt
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1
dc.identifier.cristin2019809
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=IEEE Transactions on Plasma Science&rft.volume=50&rft.spage=1237&rft.date=2022
dc.identifier.jtitleIEEE Transactions on Plasma Science
dc.identifier.volume50
dc.identifier.issue5
dc.identifier.startpage1237
dc.identifier.endpage1245
dc.identifier.doihttps://doi.org/10.1109/TPS.2022.3164220
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0093-3813
dc.type.versionPublishedVersion
dc.relation.projectEC/H2020/866357
dc.relation.projectSIGMA2/NN9761K
dc.relation.projectNFR/275653


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