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dc.date.accessioned2022-04-04T17:26:09Z
dc.date.available2022-04-04T17:26:09Z
dc.date.created2021-08-06T12:39:19Z
dc.date.issued2021
dc.identifier.citationAzarov, Alexander Venkatachalapathy, Vishnukanthan Monakhov, Eduard Kuznetsov, Andrej . Dominating migration barrier for intrinsic defects in gallium oxide: Dose-rate effect measurements. Applied Physics Letters. 2021, 118(23)
dc.identifier.urihttp://hdl.handle.net/10852/93281
dc.description.abstractIon bombardment provides an opportunity to study basic properties of intrinsic defects in materials since the radiation-induced disorder accumulation depends on the balance between defect generation and migration rates. In particular, variation of such parameters as irradiation temperature and ion flux, known in the literature as dose-rate effect, interconnects the macroscopically measured lattice disorder with the migration barrier of the dominating defects. In this work, we measured the dose-rate effect in monoclinic gallium oxide (β-Ga2O3) and extracted its activation energy of 0.8 ± 0.1 eV in the range of 25–250 °C. Taking into account that the measurements were performed in the Ga-sublattice and considering 0.8 ± 0.1 eV in the context of theoretical data, we interpreted it as the migration barrier for Ga vacancies in β-Ga2O3, limiting the process. Additionally, we observed and took into account an interesting form of the lattice relaxation due to radiation-induced disorder buildup, interpreted in terms of the compressive strain accumulation, potentially trigging phase transitions in Ga2O3 lattice.
dc.languageEN
dc.titleDominating migration barrier for intrinsic defects in gallium oxide: Dose-rate effect measurements
dc.typeJournal article
dc.creator.authorAzarov, Alexander
dc.creator.authorVenkatachalapathy, Vishnukanthan
dc.creator.authorMonakhov, Eduard
dc.creator.authorKuznetsov, Andrej
cristin.unitcode185,15,4,0
cristin.unitnameFysisk institutt
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode2
dc.identifier.cristin1924371
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Applied Physics Letters&rft.volume=118&rft.spage=&rft.date=2021
dc.identifier.jtitleApplied Physics Letters
dc.identifier.volume118
dc.identifier.issue23
dc.identifier.doihttps://doi.org/10.1063/5.0051047
dc.identifier.urnURN:NBN:no-95852
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0003-6951
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/93281/1/APL21-AR-02433_AM.pdf
dc.type.versionAcceptedVersion
cristin.articleid232101
dc.relation.projectNFR/261574
dc.relation.projectNFR/295864
dc.relation.projectNFR/257639


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