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dc.date.accessioned2022-03-30T17:25:03Z
dc.date.available2022-03-30T17:25:03Z
dc.date.created2021-09-30T15:44:25Z
dc.date.issued2021
dc.identifier.citationNyborg, Martin Azarov, Alexander Bergum, Kristin Monakhov, Eduard . Deposition and characterization of lithium doped direct current magnetron sputtered Cu2O films. Thin Solid Films. 2021, 722(31), 1-5
dc.identifier.urihttp://hdl.handle.net/10852/93098
dc.languageEN
dc.rightsAttribution 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titleDeposition and characterization of lithium doped direct current magnetron sputtered Cu2O films
dc.typeJournal article
dc.creator.authorNyborg, Martin
dc.creator.authorAzarov, Alexander
dc.creator.authorBergum, Kristin
dc.creator.authorMonakhov, Eduard
cristin.unitcode185,15,4,0
cristin.unitnameFysisk institutt
cristin.ispublishedtrue
cristin.fulltextpreprint
cristin.qualitycode1
dc.identifier.cristin1941584
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Thin Solid Films&rft.volume=722&rft.spage=1&rft.date=2021
dc.identifier.jtitleThin Solid Films
dc.identifier.volume722
dc.identifier.issue31
dc.identifier.doihttps://doi.org/10.1016/j.tsf.2021.138573
dc.identifier.urnURN:NBN:no-95664
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0040-6090
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/93098/4/1-s2.0-S0040609021000560-main.pdf
dc.type.versionPublishedVersion
cristin.articleid138573
dc.relation.projectNFR/295864
dc.relation.projectNFR/257639
dc.relation.projectNFR/288596


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