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dc.date.accessioned2021-05-04T18:44:33Z
dc.date.available2022-04-23T22:45:54Z
dc.date.created2021-04-26T08:43:37Z
dc.date.issued2021
dc.identifier.citationKarjalainen, Antti Weiser, Philip Michael Makkonen, I. Reinertsen, Vilde Mari Vines, Lasse Tuomisto, Filip . Interplay of vacancies, hydrogen, and electrical compensation in irradiated and annealed n-type β-Ga2O3. Journal of Applied Physics. 2021, 129
dc.identifier.urihttp://hdl.handle.net/10852/85944
dc.description.abstractPositron annihilation spectroscopy, Fourier transform-infrared absorption spectroscopy, and secondary ion mass spectrometry have been used to study the behavior of gallium vacancy-related defects and hydrogen in deuterium (D) implanted and subsequently annealed β-Ga2O3 single crystals. The data suggest the implantation generates a plethora of VGa-related species, including VGa1- and VGa2-type defects. The latter’s contribution to the positron signal was enhanced after an anneal at 300 ∘C, which is driven by the passivation of VibGa by hydrogen as seen from infrared measurements. Subsequent annealing near 600 ∘C returns the positron signal to levels similar to those in the as-received samples, which suggests that split VGa-like defects are still present in the sample. The almost complete removal of the VibGa-2D vibrational line, the appearance of new weak O-D lines in the same spectral region, and the lack of D out-diffusion from the samples suggest that the 600 ∘C anneal promotes the formation of either D-containing, IR-inactive complexes or defect complexes between VibGa-2D and other implantation-induced defects. The degree of electrical compensation is found to be governed by the interactions between the Ga vacancies and hydrogen.
dc.languageEN
dc.titleInterplay of vacancies, hydrogen, and electrical compensation in irradiated and annealed n-type β-Ga2O3
dc.typeJournal article
dc.creator.authorKarjalainen, Antti
dc.creator.authorWeiser, Philip Michael
dc.creator.authorMakkonen, I.
dc.creator.authorReinertsen, Vilde Mari
dc.creator.authorVines, Lasse
dc.creator.authorTuomisto, Filip
cristin.unitcode185,15,17,20
cristin.unitnameSenter for Materialvitenskap og Nanoteknologi fysikk
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1
dc.identifier.cristin1906318
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal of Applied Physics&rft.volume=129&rft.spage=&rft.date=2021
dc.identifier.jtitleJournal of Applied Physics
dc.identifier.volume129
dc.identifier.issue16
dc.identifier.doihttps://doi.org/10.1063/5.0042518
dc.identifier.urnURN:NBN:no-88596
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0021-8979
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/85944/1/KarjalainenA.JApplPhys.129.165702.2021_interplay%2Bof%2BV%252C%2BH%252C%2Band%2Belectrical%2Bcompensation%2Bin%2Birradiated%2Band%2Bannealed%2Bn-type%2BGa2O3.pdf
dc.type.versionPublishedVersion
cristin.articleid165702


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