dc.date.accessioned | 2021-04-14T19:44:56Z | |
dc.date.available | 2021-04-14T19:44:56Z | |
dc.date.created | 2020-09-11T16:56:21Z | |
dc.date.issued | 2020 | |
dc.identifier.citation | Chandrasekaran, Abinaya Bethke, Kevin Andrei, Virgil Baumann, Jonas Pollakowski-Herrmann, Beatrix Kanngießer, Birgit Beckhoff, Burkhard Vásquez, Cristian Mayandi, Jeyanthinath Finstad, Terje Rademann, Klaus . The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films. RSC Advances. 2020 | |
dc.identifier.uri | http://hdl.handle.net/10852/85248 | |
dc.description.abstract | The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu(I)Cu(II) oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient (S) reached values of up to 204 μV K−1, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m−1, resulting in a power factor of 2 μW m−1 K−2. The results reveal the interplay between the intrinsic composition and the thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by simply varying the annealing atmosphere. | |
dc.language | EN | |
dc.rights | Attribution-NonCommercial 3.0 Unported | |
dc.rights.uri | http://creativecommons.org/licenses/by-nc/3.0/ | |
dc.title | The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films | |
dc.type | Journal article | |
dc.creator.author | Chandrasekaran, Abinaya | |
dc.creator.author | Bethke, Kevin | |
dc.creator.author | Andrei, Virgil | |
dc.creator.author | Baumann, Jonas | |
dc.creator.author | Pollakowski-Herrmann, Beatrix | |
dc.creator.author | Kanngießer, Birgit | |
dc.creator.author | Beckhoff, Burkhard | |
dc.creator.author | Vásquez, Cristian | |
dc.creator.author | Mayandi, Jeyanthinath | |
dc.creator.author | Finstad, Terje | |
dc.creator.author | Rademann, Klaus | |
cristin.unitcode | 185,15,17,0 | |
cristin.unitname | Senter for materialvitenskap og nanoteknologi | |
cristin.ispublished | true | |
cristin.fulltext | postprint | |
cristin.qualitycode | 1 | |
dc.identifier.cristin | 1829221 | |
dc.identifier.bibliographiccitation | info:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=RSC Advances&rft.volume=&rft.spage=&rft.date=2020 | |
dc.identifier.jtitle | RSC Advances | |
dc.identifier.volume | 10 | |
dc.identifier.issue | 49 | |
dc.identifier.startpage | 29394 | |
dc.identifier.endpage | 29401 | |
dc.identifier.doi | https://doi.org/10.1039/D0RA03906C | |
dc.identifier.urn | URN:NBN:no-87845 | |
dc.type.document | Tidsskriftartikkel | |
dc.type.peerreviewed | Peer reviewed | |
dc.source.issn | 2046-2069 | |
dc.identifier.fulltext | Fulltext https://www.duo.uio.no/bitstream/handle/10852/85248/4/d0ra03906c.pdf | |
dc.type.version | PublishedVersion | |
dc.relation.project | NFR/245963 | |
dc.relation.project | NFR/251131 | |
dc.relation.project | OTHER/DST/INT/FRG/DAAD/P-29/2017 dated 20.06.2017 | |