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dc.date.accessioned2021-04-13T07:08:15Z
dc.date.available2021-04-13T07:08:15Z
dc.date.created2018-06-04T17:31:33Z
dc.date.issued2018
dc.identifier.citationDesissa, Temesgen D. Schrade, Matthias Norby, Truls Eivind . Electrical Properties of a p–n Heterojunction of Li-Doped NiO and Al-Doped ZnO for Thermoelectrics. Journal of Electronic Materials. 2018, 47(9), 5296-5301
dc.identifier.urihttp://hdl.handle.net/10852/85211
dc.description.abstractThe electrical properties of a p–n heterojunction of polycrystalline p-type Ni0.98Li0.02O and n-type Zn0.98Al0.02O have been investigated for potential applications in high-temperature oxide-based thermoelectric generators without metallic interconnects. Current–voltage characteristics of the junction were measured in a two-electrode setup in ambient air at 500–1000°C. The resistance and rectification of the junction decreased with increasing temperature. A non-ideal Shockley diode model was used to fit the measured current–voltage data in order to extract characteristic parameters of the junction, such as area specific series resistance Rs and parallel shunt resistance Rp, non-ideality factor, and the saturation current density. Rs and Rp decreased exponentially with temperature, with activation energies of 0.4 ± 0.1 eV and 1.1 ± 0.2 eV, respectively. The interface resistance of the direct p–n junction studied here is as such too high for practical applications in thermoelectrics. However, it is demonstrated that it can be reduced by an order of magnitude by using a composite of the individual materials at the interface, yielding a large effective contact area.
dc.languageEN
dc.titleElectrical Properties of a p–n Heterojunction of Li-Doped NiO and Al-Doped ZnO for Thermoelectrics
dc.typeJournal article
dc.creator.authorDesissa, Temesgen D.
dc.creator.authorSchrade, Matthias
dc.creator.authorNorby, Truls Eivind
cristin.unitcode185,15,17,0
cristin.unitnameSenter for materialvitenskap og nanoteknologi
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1
dc.identifier.cristin1588894
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal of Electronic Materials&rft.volume=47&rft.spage=5296&rft.date=2018
dc.identifier.jtitleJournal of Electronic Materials
dc.identifier.volume47
dc.identifier.issue9
dc.identifier.startpage5296
dc.identifier.endpage5301
dc.identifier.doihttps://doi.org/10.1007/s11664-018-6394-3
dc.identifier.urnURN:NBN:no-87830
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0361-5235
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/85211/2/Temesgen_PostPrint.pdf
dc.type.versionAcceptedVersion
dc.relation.projectNFR/228854


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