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dc.date.accessioned2021-02-14T20:48:58Z
dc.date.available2021-02-18T23:46:00Z
dc.date.created2020-08-18T23:04:45Z
dc.date.issued2020
dc.identifier.citationZimmermann, Christian Frodason, Ymir Kalmann Barnard, Abraham Willem Varley, Joel B Irmscher, Klaus Galazka, Zbigniew Karjalainen, Antti Meyer, Walter Ernst Auret, F.D. Vines, Lasse . Ti- and Fe-related charge transition levels in beta-Ga2O3. Applied Physics Letters. 2020, 116(7)
dc.identifier.urihttp://hdl.handle.net/10852/83252
dc.description.abstractDeep-level transient spectroscopy measurements on β-Ga2O3 crystals reveal the presence of three defect signatures labeled E2a, E2b, and E3 with activation energies at around 0.66 eV, 0.73 eV, and 0.95 eV below the conduction band edge. Using secondary ion mass spectrometry, a correlation between the defect concentration associated with E3 and the Ti concentration present in the samples was found. Particularly, it is found that E3 is the dominant Ti-related defect in β-Ga2O3 and is associated with a single Ti atom. This finding is further corroborated by hybrid functional calculations that predict Ti substituting on an octahedral Ga site, denoted as TiGaII, to be a good candidate for E3. Moreover, the deep level transient spectroscopy results show that the level previously labeled E2 and attributed to Fe substituting on a gallium site (FeGa) consists of two overlapping signatures labeled E2a and E2b. We tentatively assign E2a and E2b to Fe substituting for Ga on a tetrahedral or an octahedral site, respectively.
dc.languageEN
dc.titleTi- and Fe-related charge transition levels in beta-Ga2O3
dc.typeJournal article
dc.creator.authorZimmermann, Christian
dc.creator.authorFrodason, Ymir Kalmann
dc.creator.authorBarnard, Abraham Willem
dc.creator.authorVarley, Joel B
dc.creator.authorIrmscher, Klaus
dc.creator.authorGalazka, Zbigniew
dc.creator.authorKarjalainen, Antti
dc.creator.authorMeyer, Walter Ernst
dc.creator.authorAuret, F.D.
dc.creator.authorVines, Lasse
cristin.unitcode185,15,17,0
cristin.unitnameSenter for materialvitenskap og nanoteknologi
cristin.ispublishedtrue
cristin.fulltextpreprint
cristin.qualitycode2
dc.identifier.cristin1823937
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Applied Physics Letters&rft.volume=116&rft.spage=&rft.date=2020
dc.identifier.jtitleApplied Physics Letters
dc.identifier.volume116
dc.identifier.issue7
dc.identifier.doihttps://doi.org/10.1063/1.5139402
dc.identifier.urnURN:NBN:no-85977
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0003-6951
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/83252/5/1.5139402.pdf
dc.type.versionPublishedVersion
cristin.articleid072101
dc.relation.projectNFR/245963
dc.relation.projectNOTUR/NORSTORE/NN9136K
dc.relation.projectNFR/251131


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