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dc.date.accessioned2020-09-29T18:52:43Z
dc.date.available2020-09-29T18:52:43Z
dc.date.created2020-08-29T00:40:27Z
dc.date.issued2021
dc.identifier.citationIordanidou, Konstantina Persson, Clas . Optoelectronic properties of coexisting InGaZnO4 structures. Materials Science in Semiconductor Processing. 2021, 121, 105297
dc.identifier.urihttp://hdl.handle.net/10852/80163
dc.description.abstractIndium gallium zinc oxides (IGZO) have been developed for thin-film transistor technologies. In this work, we analyze the fundamental properties of crystalline InGaZnO4, considering all possible Ga/Zn atomic distribution patterns. Using the hybrid Hartree-Fock density functional approach, the most stable configurations are identified. The simulations reveal that the considered configurations are indirect band-gap semiconductors with highly dispersive conduction bands (CB) and very flat valence bands (VB). Thereby, the electron effective masses are light, contrary to the heavy hole effective masses. This implies a good electron mobility and suppressed hole mobility, and consequently a low off-state current that minimizes the power consumption in future InGaZnO4-based transistors. Coexistence of different configurations is not an issue for InGaZnO4 since they all present very similar optoelectronic properties.
dc.languageEN
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/
dc.titleOptoelectronic properties of coexisting InGaZnO4 structures
dc.typeJournal article
dc.creator.authorIordanidou, Konstantina
dc.creator.authorPersson, Clas
cristin.unitcode185,15,4,0
cristin.unitnameFysisk institutt
cristin.ispublishedtrue
cristin.fulltextpostprint
cristin.qualitycode1
dc.identifier.cristin1825877
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Materials Science in Semiconductor Processing&rft.volume=121&rft.spage=105297&rft.date=2021
dc.identifier.jtitleMaterials Science in Semiconductor Processing
dc.identifier.volume121
dc.identifier.startpage105297
dc.identifier.doihttps://doi.org/10.1016/j.mssp.2020.105297
dc.identifier.urnURN:NBN:no-83254
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn1369-8001
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/80163/4/manuscript-f.pdf
dc.type.versionAcceptedVersion
dc.relation.projectNFR/251131
dc.relation.projectNOTUR/NORSTORE/NN9180K


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Attribution-NonCommercial-NoDerivatives 4.0 International
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