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dc.date.accessioned2018-11-13T11:17:01Z
dc.date.available2018-11-13T11:17:01Z
dc.date.created2017-07-26T16:57:53Z
dc.date.issued2017
dc.identifier.citationHeng, Chenglin Xiang, W. Su, W.Y. Wu, H.C. Gao, Y.K. Yin, P.G. Finstad, Terje . Strong near band edge emission of (Ce, Yb) co-doped ZnO thin films after high temperature annealing. Optical Materials Express. 2017, 7(8), 3041-3050
dc.identifier.urihttp://hdl.handle.net/10852/65476
dc.description.abstractWe studied the photoluminescence (PL) properties of (Ce + Yb) co-doped ZnO thin films as a function of high temperature annealing. The films were fabricated by magnetron sputtering. After 1000-1100°C annealing, the near band edge (NBE) emissions of the films were dozens to a hundred times stronger than that of undoped ZnO, while the Yb3+ emission (~980 nm) was quite weak, indicating that energy transfers from the ZnO host to Yb3+ ions in the films were not efficient. X-ray diffraction analysis and scanning electron microscopy observations demonstrated that the (Ce + Yb) co-doping had a large effect on the morphology and crystallinity of the films. The crystallinity enhancement of the films is considered to be the main reason for the strong NBE enhancements of the co-doped ZnO films. © 2017 Optical Society of Americaen_US
dc.languageEN
dc.titleStrong near band edge emission of (Ce, Yb) co-doped ZnO thin films after high temperature annealingen_US
dc.typeJournal articleen_US
dc.creator.authorHeng, Chenglin
dc.creator.authorXiang, W.
dc.creator.authorSu, W.Y.
dc.creator.authorWu, H.C.
dc.creator.authorGao, Y.K.
dc.creator.authorYin, P.G.
dc.creator.authorFinstad, Terje
cristin.unitcode185,15,4,90
cristin.unitnameHalvlederfysikk
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1
dc.identifier.cristin1483182
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Optical Materials Express&rft.volume=7&rft.spage=3041&rft.date=2017
dc.identifier.jtitleOptical Materials Express
dc.identifier.volume7
dc.identifier.issue8
dc.identifier.startpage3041
dc.identifier.endpage3050
dc.identifier.doihttp://dx.doi.org/10.1364/OME.7.003041
dc.identifier.urnURN:NBN:no-68327
dc.type.documentTidsskriftartikkelen_US
dc.type.peerreviewedPeer reviewed
dc.source.issn2159-3930
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/65476/4/ome-7-8-3041.pdf
dc.type.versionPublishedVersion


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