dc.date.accessioned | 2017-05-16T12:55:44Z | |
dc.date.available | 2017-06-08T22:31:15Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | http://hdl.handle.net/10852/55423 | |
dc.description.abstract | Thin films of complex alkali oxides are frequently investigated due to the large range of electric effects that are found in this class of materials. Their piezo- and ferroelectric properties also place them as sustainable lead free alternatives in optoelectronic devices. Fully gas-based routes for deposition of such compounds are required for integration into microelectronic devices that need conformal thin films with high control of thickness- and composition. The authors here present a route for deposition of materials in the (K,Na)(Nb,Ta)O3-system, including the four end members NaNbO3, KNbO3, NaTaO3, and KTaO3, using atomic layer deposition with emphasis on control of stoichiometry in such mixed quaternary and quinary compunds. | en_US |
dc.language.iso | en | en_US |
dc.relation.ispartof | Sønsteby, Henrik Hovde (2017) Piezo- and Ferroelectric A+B5+O3 Thin Films. Doctoral thesis. http://urn.nb.no/URN:NBN:no-58216 | |
dc.relation.uri | http://urn.nb.no/URN:NBN:no-58216 | |
dc.title | Atomic layer deposition of (K,Na)(Nb,Ta)O3 thin films | en_US |
dc.type | Journal article | en_US |
dc.creator.author | Sønsteby, Henrik Hovde | |
dc.creator.author | Nilsen, Ola | |
dc.creator.author | Fjellvåg, Helmer | |
dc.identifier.cristin | 1368546 | |
dc.identifier.jtitle | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films | |
dc.identifier.volume | 34 | |
dc.identifier.doi | http://dx.doi.org/10.1116/1.4953406 | |
dc.identifier.urn | URN:NBN:no-58215 | |
dc.type.document | Tidsskriftartikkel | en_US |
dc.type.peerreviewed | Peer reviewed | |
dc.identifier.fulltext | Fulltext https://www.duo.uio.no/bitstream/handle/10852/55423/1/1-4953406.pdf | |
dc.type.version | PublishedVersion | |
cristin.articleid | 041508 | |