dc.date.accessioned | 2017-05-16T12:50:45Z | |
dc.date.available | 2017-05-16T12:50:45Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | http://hdl.handle.net/10852/55422 | |
dc.description.abstract | Thin films of sodium and potassium oxides have for the first time been deposited using atomic layer deposition. Sodium and potassium complexes of tert-butanol, trimethylsilanol and hexamethyldisilazide have been evaluated as precursors by characterising their thermal properties as well as tested in applications for thin film depositions. Out of these, sodium and potassium tert-butoxide and sodium trimethylsilanolate and hexamethyldisilazide were further tested as precursors together with the Al(CH3)3 + H2O/O3 process to form aluminates and together with ozone to form silicates. Sodium and potassium tert-butoxide and sodium trimethylsilanolate showed self-limiting growth and proved useable at deposition temperatures from 225 to 375 or 300 °C, respectively. The crystal structures of NaOtBu and KOtBu were determined by single crystal diffraction revealing hexamer- and tetramer structures, respectively. The current work demonstrates the suitability of the ALD technique to deposit thin films containing alkaline elements even at 8′′ wafer scale. | en_US |
dc.language.iso | en | en_US |
dc.relation.ispartof | Sønsteby, Henrik Hovde (2017) Piezo- and Ferroelectric A+B5+O3 Thin Films. Doctoral thesis. http://urn.nb.no/URN:NBN:no-58216 | |
dc.relation.uri | http://urn.nb.no/URN:NBN:no-58216 | |
dc.rights | Attribution 3.0 Unported | |
dc.rights.uri | https://creativecommons.org/licenses/by/3.0/ | |
dc.title | Atomic layer deposition of sodium and potassium oxides: evaluation of precursors and deposition of thin films | en_US |
dc.type | Journal article | en_US |
dc.creator.author | Østreng, Erik | |
dc.creator.author | Sønsteby, Henrik H. | |
dc.creator.author | Øien, Sigurd | |
dc.creator.author | Nilsen, Ola | |
dc.creator.author | Fjellvåg, Helmer | |
dc.identifier.jtitle | Dalton Transactions | |
dc.identifier.volume | 43 | |
dc.identifier.startpage | 16666 | |
dc.identifier.endpage | 16672 | |
dc.identifier.doi | http://dx.doi.org/10.1039/c4dt01930j | |
dc.identifier.urn | URN:NBN:no-58213 | |
dc.type.document | Tidsskriftartikkel | en_US |
dc.type.peerreviewed | Peer reviewed | |
dc.identifier.fulltext | Fulltext https://www.duo.uio.no/bitstream/handle/10852/55422/1/c4dt01930j.pdf | |
dc.type.version | PublishedVersion | |