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dc.date.accessioned2017-01-31T10:09:54Z
dc.date.available2017-07-12T22:31:14Z
dc.date.created2016-09-19T13:14:09Z
dc.date.issued2016
dc.identifier.citationChan, K.S Vines, Lasse Li, L Jagadish, C Svensson, Bengt Gunnar Wong-Leung, J . Zn precipitation and Li depletion in Zn implanted ZnO. Applied Physics Letters. 2016, 109(2)
dc.identifier.urihttp://hdl.handle.net/10852/53661
dc.description.abstractIon implantation of Zn substituting elements in ZnO has been shown to result in a dramatic Li depletion of several microns in hydrothermally grown ZnO. This has been ascribed to a burst of mobile Zn interstials. In this study, we seek to understand the reason behind this interstitial mediated transient enhanced diffusion in Li-containing ZnO samples after Zn implantation. ZnO wafers were implanted with Zn to two doses, 5 × 1015 cm−2 and 1 × 1017 cm−2. Secondary ion mass spectrometry was carried out to profile the Li depletion depth for different annealing temperatures between 600 and 800 °C. The 800 °C annealing had the most significant Li depletion of close to 60 μm. Transmission electron microscopy (TEM) was carried out in selected samples to identify the reason behind the Li depletion. In particular, TEM investigations of samples annealed at 750 °C show significant Zn precipitation just below the depth of the projected range of the implanted ions. We propose that the Zn precipitation is indicative of Zn supersaturation. Both the Li depletion and Zn precipitation are competing synchronous processes aimed at reducing the excess Zn interstitials. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing.en_US
dc.languageEN
dc.language.isoenen_US
dc.publisherAmerican Institute of Physics
dc.titleZn precipitation and Li depletion in Zn implanted ZnOen_US
dc.typeJournal articleen_US
dc.creator.authorChan, K.S
dc.creator.authorVines, Lasse
dc.creator.authorLi, L
dc.creator.authorJagadish, C
dc.creator.authorSvensson, Bengt Gunnar
dc.creator.authorWong-Leung, J
cristin.unitcode185,15,4,90
cristin.unitnameHalvlederfysikk
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode2
dc.identifier.cristin1382704
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Applied Physics Letters&rft.volume=109&rft.spage=&rft.date=2016
dc.identifier.jtitleApplied Physics Letters
dc.identifier.volume109
dc.identifier.issue2
dc.identifier.doihttp://dx.doi.org/10.1063/1.4958693
dc.identifier.urnURN:NBN:no-56833
dc.type.documentTidsskriftartikkelen_US
dc.type.peerreviewedPeer reviewed
dc.source.issn0003-6951
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/53661/1/1.4958693.pdf
dc.type.versionPublishedVersion
cristin.articleid022102


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