Browsing Kjemisk institutt by Author "Elam, Jeffrey W."

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  • Consistency and reproducibility in atomic layer deposition 
    Sønsteby, Henrik Hovde; Yanguas-Gil, Angel; Elam, Jeffrey W. (Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2020)
    Atomic layer deposition (ALD) is a thin film synthesis technique that can provide exquisite accuracy and precision in film thickness and composition even on complex, large area substrates. Based on self-limiting surface ...
  • tert-butoxides as precursors for atomic layer deposition of alkali metal containing thin films 
    Sønsteby, Henrik Hovde; Bratvold, Jon Einar; Killi, Veronica Anne-Line Kathrine; Choudhury, Devika; Elam, Jeffrey W.; Fjellvåg, Helmer; Nilsen, Ola (Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2020)
    Alkali metal containing materials have become increasingly attractive in a world hunting for sustainable energy materials and green functional devices. Lithium- and sodium battery technology, lead-free piezo- and ferroelectric ...