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dc.date.accessioned2013-03-12T08:28:43Z
dc.date.available2013-03-12T08:28:43Z
dc.date.issued2009en_US
dc.date.submitted2009-09-01en_US
dc.identifier.citationEikeland, Erik. Nanoscale Double-Gate SRAM Design. Masteroppgave, University of Oslo, 2009en_US
dc.identifier.urihttp://hdl.handle.net/10852/11263
dc.description.abstractThis work uses an extensive number of simulations to determine the usability of DG MOSFETs in SRAM circuit design. The simulations have been carried out in Silvaco ATLAS and MixedMode model and circuit simulation software. Structures with gate lengths of 50 nm and 20 nm have been tested both on their own and incorporated into larger circuitry, and these are showing promising results.eng
dc.language.isoengen_US
dc.titleNanoscale Double-Gate SRAM Designen_US
dc.typeMaster thesisen_US
dc.date.updated2011-12-15en_US
dc.creator.authorEikeland, Eriken_US
dc.subject.nsiVDP::430en_US
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&rft.au=Eikeland, Erik&rft.title=Nanoscale Double-Gate SRAM Design&rft.inst=University of Oslo&rft.date=2009&rft.degree=Masteroppgaveen_US
dc.identifier.urnURN:NBN:no-26081en_US
dc.type.documentMasteroppgaveen_US
dc.identifier.duo94392en_US
dc.contributor.supervisorTor Fjeldlyen_US
dc.identifier.bibsys115006281en_US
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/11263/1/Masterxx1x.pdf


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