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dc.date.accessioned2024-04-02T15:56:27Z
dc.date.available2024-04-02T15:56:27Z
dc.date.created2023-06-22T15:06:23Z
dc.date.issued2023
dc.identifier.citationWang, Xingyi Zimmermann, Christian Titze, Michael Niaouris, Vasileios Hansen, Ethan R. D'Ambrosia, Samuel H. Vines, Lasse Bielejec, Edward S. Fu, Kai-Mei C. . Properties of Donor Qubits in Zn O Formed by Indium-Ion Implantation. Physical Review Applied. 2023, 19(5)
dc.identifier.urihttp://hdl.handle.net/10852/110242
dc.description.abstractNeutral shallow donors (D0) in ZnO have emerged as a promising candidate for solid-state spin qubits. Here we report on the formation of D0 in ZnO via implantation of In and subsequent annealing. The implanted In donors exhibit optical and spin properties on par with those of in situ–doped donors. The inhomogeneous linewidth of the donor-bound-exciton transition is less than 10 GHz, comparable to the optical linewidth of in situ In. Longitudinal spin relaxation times (T1) exceed reported values for in situ Ga donors, indicating that residual In-implantation damage does not degrade T1. Two-laser Raman spectroscopy of the donor spin reveals the hyperfine interaction of the donor electron with the spin-9/2 In nuclei. This work is an important step toward the deterministic formation of In-donor qubits in ZnO with optical access to a long-lived nuclear-spin memory.
dc.languageEN
dc.publisherAmerican Physical Society
dc.titleProperties of Donor Qubits in Zn O Formed by Indium-Ion Implantation
dc.title.alternativeENEngelskEnglishProperties of Donor Qubits in Zn O Formed by Indium-Ion Implantation
dc.typeJournal article
dc.creator.authorWang, Xingyi
dc.creator.authorZimmermann, Christian
dc.creator.authorTitze, Michael
dc.creator.authorNiaouris, Vasileios
dc.creator.authorHansen, Ethan R.
dc.creator.authorD'Ambrosia, Samuel H.
dc.creator.authorVines, Lasse
dc.creator.authorBielejec, Edward S.
dc.creator.authorFu, Kai-Mei C.
cristin.unitcode185,15,4,90
cristin.unitnameHalvlederfysikk
cristin.ispublishedtrue
cristin.fulltextpreprint
cristin.qualitycode2
dc.identifier.cristin2157222
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Physical Review Applied&rft.volume=19&rft.spage=&rft.date=2023
dc.identifier.jtitlePhysical Review Applied
dc.identifier.volume19
dc.identifier.issue5
dc.identifier.pagecount0
dc.identifier.doihttps://doi.org/10.1103/PhysRevApplied.19.054090
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn2331-7019
dc.type.versionPublishedVersion
cristin.articleid054090
dc.relation.projectNFR/325573
dc.relation.projectNFR/295864


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