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dc.date.accessioned2024-03-25T17:24:30Z
dc.date.available2024-03-25T17:24:30Z
dc.date.created2023-06-22T15:08:49Z
dc.date.issued2023
dc.identifier.citationBathen, Marianne Etzelmüller Selnesaunet, Gard Momrak Enga, Marius Kjeldby, Snorre B. Müting, Johanna Vines, Lasse Grossner, Ulrike . Charge State Control Over Point Defects in SiC Devices. Defect and Diffusion Forum. 2023, 425, 35-42
dc.identifier.urihttp://hdl.handle.net/10852/110112
dc.description.abstractPoint defects in silicon carbide (SiC) are well positioned for integration with SiC based quantum photonic devices due to the maturity of SiC material and fabrication technology, the plethora of candidate quantum emitters that can be formed in SiC, and the potential for emission over a wide spectral range from the visible to the infrared. However, for each of the available color centers in SiC, only one of the charge states has displayed quantum emission, meaning that the emission strongly depends on the Fermi level and hence the doping concentration in the material. In this contribution, we discuss the methodology and mechanism for electrical charge-state control over point defects in SiC devices.
dc.languageEN
dc.publisherTrans Tech Publications Ltd.
dc.rightsAttribution 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titleCharge State Control Over Point Defects in SiC Devices
dc.title.alternativeENEngelskEnglishCharge State Control Over Point Defects in SiC Devices
dc.typeJournal article
dc.creator.authorBathen, Marianne Etzelmüller
dc.creator.authorSelnesaunet, Gard Momrak
dc.creator.authorEnga, Marius
dc.creator.authorKjeldby, Snorre B.
dc.creator.authorMüting, Johanna
dc.creator.authorVines, Lasse
dc.creator.authorGrossner, Ulrike
cristin.unitcode185,15,30,0
cristin.unitnameInstitutt for teknologisystemer
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1
dc.identifier.cristin2157224
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Defect and Diffusion Forum&rft.volume=425&rft.spage=35&rft.date=2023
dc.identifier.jtitleDefect and Diffusion Forum
dc.identifier.volume425
dc.identifier.startpage35
dc.identifier.endpage42
dc.identifier.doihttps://doi.org/10.4028/p-6ho92o
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn1012-0386
dc.type.versionPublishedVersion
dc.relation.projectSIGMA2/NN9136K
dc.relation.projectNFR/325573
dc.relation.projectNFR/295864


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Attribution 4.0 International
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