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dc.date.accessioned2024-03-16T17:56:01Z
dc.date.available2024-03-16T17:56:01Z
dc.date.created2023-11-09T14:44:23Z
dc.date.issued2024
dc.identifier.citationHansen, Per-Anders Stensby Sørensen, Silje Holm Desbois, Nicolas Gros, Claude P. Nilsen, Ola . Perylenes, Porphyrins, and Other Large Dye Molecules for Molecular Layer Deposition. Advanced Materials Interfaces. 2023
dc.identifier.urihttp://hdl.handle.net/10852/109688
dc.description.abstractAbstract Molecular layer deposition (MLD) is an incredibly powerful and flexible tool for designing completely new materials with novel and unique properties. The low temperature layer‐by‐layer approach and the use of highly reactive reactants allows one to combine vastly different organic and inorganic species and construct nanostructures with subnanometer precision. If not limited by the volatility of the reactants involved, the possibilities will be endless. This is most notable for the organic building blocks where an overall low volatility severely limits the toolbox of large molecules with interesting optical and electrical properties such as red‐ox activity and optical conversion. In this work, different strategies for molecular design of large molecules are investigated that allow vaporization while still having the necessary reactivity for MLD growth. Using these strategies, film growth with perylene and porphyrin derivatives, both molecules well known for their functional and optical properties are successfully achieved. With this knowledge, there is an opening to include much larger and more complex organic molecules into the world of vapor phase chemistry.
dc.languageEN
dc.rightsAttribution 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titlePerylenes, Porphyrins, and Other Large Dye Molecules for Molecular Layer Deposition
dc.title.alternativeENEngelskEnglishPerylenes, Porphyrins, and Other Large Dye Molecules for Molecular Layer Deposition
dc.typeJournal article
dc.creator.authorHansen, Per-Anders Stensby
dc.creator.authorSørensen, Silje Holm
dc.creator.authorDesbois, Nicolas
dc.creator.authorGros, Claude P.
dc.creator.authorNilsen, Ola
cristin.unitcode185,15,12,0
cristin.unitnameKjemisk institutt
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1
dc.identifier.cristin2194700
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Advanced Materials Interfaces&rft.volume=&rft.spage=&rft.date=2023
dc.identifier.jtitleAdvanced Materials Interfaces
dc.identifier.volume11
dc.identifier.issue1
dc.identifier.pagecount0
dc.identifier.doihttps://doi.org/10.1002/admi.202300667
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn2196-7350
dc.type.versionPublishedVersion
dc.relation.projectNFR/320714
dc.relation.projectNFR/257639


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This item's license is: Attribution 4.0 International