dc.date.accessioned | 2023-11-08T17:40:22Z | |
dc.date.available | 2023-11-08T17:40:22Z | |
dc.date.created | 2023-02-18T19:12:32Z | |
dc.date.issued | 2023 | |
dc.identifier.citation | Azarov, Alexander Venkatachalapathy, Vishnukanthan Lee, In-Hwan Kuznetsov, Andrej . Thermal versus radiation-assisted defect annealing in β-Ga2O3. Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. 2023, 41(2) | |
dc.identifier.uri | http://hdl.handle.net/10852/105726 | |
dc.description.abstract | Gallium oxide (Ga2O3) exhibits complex behavior under ion irradiation since ion-induced disorder affects not only the functional properties but can provoke polymorphic transformations in Ga2O3. A conventional way used to minimize the lattice disorder is by doing postirradiation anneals. An alternative approach is to prevent the disorder accumulation from the beginning, by doing implants at elevated temperatures, so that a significant fraction of the disorder dynamically anneals out in radiation-assisted processes. Here, we use these two approaches for the minimization of radiation disorder in monoclinic β-Ga2O3 implanted to a dose below the threshold required for the polymorphic transformations. The results obtained by a combination of channeling and x-ray diffraction techniques revealed that implants at 300 °C effectively suppress the defect formation in β-Ga2O3. On the other hand, in order to reach similar crystalline quality in the samples implanted at room temperature, postirradiation anneals in excess of 900 °C are necessary. | |
dc.language | EN | |
dc.title | Thermal versus radiation-assisted defect annealing in β-Ga2O3 | |
dc.title.alternative | ENEngelskEnglishThermal versus radiation-assisted defect annealing in β-Ga2O3 | |
dc.type | Journal article | |
dc.creator.author | Azarov, Alexander | |
dc.creator.author | Venkatachalapathy, Vishnukanthan | |
dc.creator.author | Lee, In-Hwan | |
dc.creator.author | Kuznetsov, Andrej | |
cristin.unitcode | 185,15,17,20 | |
cristin.unitname | Senter for Materialvitenskap og Nanoteknologi fysikk | |
cristin.ispublished | true | |
cristin.fulltext | postprint | |
cristin.qualitycode | 1 | |
dc.identifier.cristin | 2127238 | |
dc.identifier.bibliographiccitation | info:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films&rft.volume=41&rft.spage=&rft.date=2023 | |
dc.identifier.jtitle | Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films | |
dc.identifier.volume | 41 | |
dc.identifier.issue | 2 | |
dc.identifier.pagecount | 0 | |
dc.identifier.doi | https://doi.org/10.1116/6.0002388 | |
dc.type.document | Tidsskriftartikkel | |
dc.type.peerreviewed | Peer reviewed | |
dc.source.issn | 0734-2101 | |
dc.type.version | AcceptedVersion | |
cristin.articleid | 023101 | |
dc.relation.project | NFR/337627 | |
dc.relation.project | NFR/322382 | |
dc.relation.project | NFR/295864 | |